| RTP-EP | Extended power with ramp rate better 100K/sec (power x 2) |
| RTP-HT | Extended temperature up to 1200 °C |
| RTP-MFC | Additional process gas line with Mass Flow Controller (max. 3 add)*
* = all in all max. 4 process gas lines |
| FG-O2 | Forming gas – oxygen safety unit |
| RTP-Ox | Various oxygen analyser with different tolerances against H traces |
| RTP-MM | Moisture Analyzer to measure moisture residues in the chamber |
| RTP-SW-VP / CH | Switchbox for chiller and/or vacuum pump |
| TC I / TC II | add. Thermocouple to measure on device (plugged in chamber, max. 1) |
| VAC I | Basic Vacuum up to 3 hPa, Vacuum sensor, vacuum valve excl. pump (not for -HV) |
| VAC II | Comfort Vacuum up to 10-3 hPa, Pirani Sensor, vacuum valve, excl. pump (not for HV) |
| VCR | Tubing made of VCR (welded) |
| RTP-GP-200 | Graphite Plate or susceptor (optional SiC coated) |
| RTP-PC-200 | add. 200 mm oven chamber = double chamber (for usage of 2 chambers) |
| RTP-QF-200-200mm | Quartz frame for 200 mm wafer |
| RTP-QF-200-150mm | Quartz frame for 150 mm wafer |
| RTP-QF-200-100mm | Quartz frame for 100 mm wafer |
