Vacuum Process Oven VPO-300

Brand：德國UNITEMP
Lamp heated rapid thermal annealing RTA and rapid thermal processing RTP equipment are using lamp heating in order to ramp up and cool down semiconductor wafers pretty fast. This equipment is therefore mainly used for applications where the substrate needs to be brought to a certain temperature just only for short time.
Perfect for wafer up to 300 mm or substrates up to 300 x 300 mm.
Vacuum up to 10^-3hPa (VPO-300-HV up to 10^-6hPa)
For substrate size up to 300 mm x 300 mm
Temperature up to 1000 °C
Precise ramp up and fast ramp down rates
Up to 4 gas lines (Mass Flow Controller)
3 heating zones programmable, heated by Infrared lamps
50 programs with 50 steps each
Top and bottom heating (selection by Software)

Specification

Model	VPO-300
Chamber	裝載區域：300 × 300 mm 或 12”晶圓箱體尺寸：350 × 350 × 50 mm（可選：箱體高度120 mm）箱壁：鋁拋光，易於清潔（可選：不鏽鋼）
Vacuum capability	10^-3 hPa（可選：10^-6 hPa）
Temperature	高達1000°C
Temp. uniformity	≤ 1 % of set temperature (on a 200 mm wafer)
Heating	Bottom Heating: Infrared lamps cross aligned (18 kW) Top Heating: Infrared lamps cross aligned (18 kW)
Ramp up rate	40 K/sec
Ramp down rate	T = 1000°C > 400°C：200 K/min，T = 400°C > 100°C：30 /min
Flow Controller	One Mass Flow Controller for 5 nlm (= norm liter per minute) as default, up to 3 more Mass Flow Controllers are available as option
Controller	50 programs with 50 steps each
Substrate Cooling	By Nitrogen Gas
Electrical connection	2 ×（400 / 230V，18 kW）
Dimension	W540 × D690 × H890 mm
Weight	140 kg

Item	Description
VPO-CAB-UHE	Floor model with cabinet and integrated Universal Heat Exchanger (UHE)
VPO-MFC	Additional gas line with Mass Flow Controller (max. 3 add. gas lines)
VPO-EH	Chamber height 100 mm (instead of 50 mm) with viewing window (85 mm x 25 mm)
VPO-HT	Temperature extension up to 1200 °C
VPO-SS	Chamber made of stainless steel (VA 1.4305) polished, instead of aluminum 50 mm
VPO-GP	Graphite Plate or Susceptor 3 mm thick
VPO-LP	Lift pins for raising a single wafer
VPO-TC	Additional thermocouple to measure on device (plugged in chamber) (max. 3 pcs)
VPO-QP	Quartz glass plate for sealing the top lamp field
VPO-OP1	Overpressure up to 200 mbar, 10^-3 hPa up to 0,02 MPa
VPO-OP2	Overpressure up to 2000 mbar, 10^-3 hPa bis 0,2 MPa
VPO-SI	Serial interface between VPO system and external PC
VPO-RC	Remote control of top cover opening and closing (not for VPO-300-HV version)
VAC I	Basic Vacuum up to 3 hPa, Vacuum sensor, vacuum valve excl. pump (not for VPO-300-HV version)
VAC II	Comfort Vacuum up to 10-3 hPa, Pirani Sensor, vacuum valve, excl. pump
Hood L	Protective safety hood for use of 100 % hydrogen (excl. H2 sensor, gas box and flame -off unit) others on request